PArk XE-LCD0 pages
XE-LCD™ Product Datasheet
nnnnXE-LCD Atomic Force Microscope
nnnnAtomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability
nnnnto accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becom-
nnnning a powerhouse in applications involving surface roughness, trench width, depth, sidewall slope,
nnnnand linewidth characterization. Park Systems, a leader and pioneer in AFM technology, has changed
nnnnthe concept of AFM by introducing the completely automated XE-LCD for inline characterization
nnnnof flat panel displays. Park Systems's mission is to provide our industrial customers with Advanced
nnnnAFM/Scanning Probe Mcroscopy (SPM) products and solutions that extend the innovation of the
nnnnXE-series to the industrial metrology of flat panel displays.
nnnnXE Interface Means Process Compatibility and User Convenience
nnnn»>
nnnnFigure 2.
nnnnThe XE-LCD can be seamlessly incorporated as either an inline or offline inspection tool. The XE-
nnnnLCD is a fully automated system that automatically finds optimal feedback parameters and scanning
nnnnspeeds for a given sample size and surface. Our engineers and scientists fully understand and have
nnnnadopted the industry standard at every level of product development.
nnnnPark Systems is committed to the highest level of service and support, and every effort is made to
nnnnunderstand our industrial customer's needs. We place the utmost importance on meeting promised
nnnndelivery dates, guaranteed quality, and faithful after-sales service.
nnnnAutomatic AFM Measurement
nnnnOur innovative vision system and pattern recognition algorithm enable fully automatic operation of
nnnnAFM measurements so that you can focus on critical process issues. The optical video microscope
nnnnautomatically focuses itself on a sample or on a probing tip by recognizing the pattern of the cantile-
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nnnnEquipments
nnnnSECS
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Jem B Data Server |
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