MM Series Cathodes0 pages
M M-Se ri es Side Mount
nnnnSPUTTERING
nnnnCOMPONENTS
nnnnFEATURES:
nnnnO Customized drive shaft length
nnnnO Patented power-delivery technology
nnnnO Ultra compact and flexible form factor
nnnnO Easy access seal cartridges
nnnnO Magnet bar externally adjustable to any
nnnnangle
nnnnO Patented target water fill/drain feature
nnnnO Simple design - fewer parts
nnnnBENEFITS:
nnnnO All utilities are external
nnnnO Utilities remain attached during target
nnnnchangeover
nnnnO Wider glass coverage than traditional end
nnnnblocks
nnnnO Fits most chamber designs
nnnnO High-power with no inductive heating
nnnnimpact - no brush dust.
nnnnO High-packing density; dual cathodes in
nnnn350mm space (171mm center-to-center)
nnnnO Drive motors mount up, down, sideways,
nnnnin or out
nnnnO Simple, in-house maintenance
nnnnO Allows co-sputtering, tighter plasma
nnnncoupling, and limits shield coating
nnnnO Keeps your coater dry during target
nnnnchanges, which reduces pump time and
nnnnstabilizes your process much faster
nnnnPatented MM-Series Side Mount
nnnnRotary Cathode
nnnnRETROFIT:
nnnnO Coater modification and integration
nnnnsupport available
nnnnO Ultra compact and flexible design to fit
nnnnalmost every chamber style
nnnnO Switch between planars and sidemounts
nnnnin the same slot
nnnnNEW SYSTEM INSTALLATIONS:
nnnnO SCI's compact design allows chamber
nnnndesign flexibility and the ability to
nnnninstall more cathodes in your system
nnnnO Integrate with TRM-Bar™ or QRM-Bar™
nnnnmagnetics and e-Cathode™ lid systems
nnnne | Power | V/A | Target (mm) | ||||||
MM | Up to lOOkW DC or 80 kHz MFAC | 1000v/225A | Up to 2000 |
Sputtering Components, Ine 375 Alexander Drive, Owatonna, Minnesota 55060 USA
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