PArk XE-LCD0 pages

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XE-LCD™ Product Datasheet

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XE-LCD Atomic Force Microscope

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Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability

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to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becom-

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ing a powerhouse in applications involving surface roughness, trench width, depth, sidewall slope,

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and linewidth characterization. Park Systems, a leader and pioneer in AFM technology, has changed

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the concept of AFM by introducing the completely automated XE-LCD for inline characterization

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of flat panel displays. Park Systems's mission is to provide our industrial customers with Advanced

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AFM/Scanning Probe Mcroscopy (SPM) products and solutions that extend the innovation of the

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XE-series to the industrial metrology of flat panel displays.

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XE Interface Means Process Compatibility and User Convenience

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Figure 2.

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The XE-LCD can be seamlessly incorporated as either an inline or offline inspection tool. The XE-

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LCD is a fully automated system that automatically finds optimal feedback parameters and scanning

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speeds for a given sample size and surface. Our engineers and scientists fully understand and have

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adopted the industry standard at every level of product development.

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Park Systems is committed to the highest level of service and support, and every effort is made to

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understand our industrial customer's needs. We place the utmost importance on meeting promised

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delivery dates, guaranteed quality, and faithful after-sales service.

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Automatic AFM Measurement

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Our innovative vision system and pattern recognition algorithm enable fully automatic operation of

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AFM measurements so that you can focus on critical process issues. The optical video microscope

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automatically focuses itself on a sample or on a probing tip by recognizing the pattern of the cantile-

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Equipments

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SECS

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Host Computer
Result/ Database
Jem B Data Server

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