Model RTP-1000 pages

Model RTP-100
Vacuum capable Rapid Thermal Process oven for single wafer
up to 4“ (100mm diameter wafer) or 100mm x 100mm substrate size

NEW

14.5 cm touch screen
display for process
control

RTP-100
Automatic opening
and closing of chamber

Features:
• Fast ramp up rates
up to 150 K/sec
• Vacuum or inert gas
atmosphere
• Up to 100 mm wafer size
• Up to 4 gas lines
• Gases: N2, O2, N2/H2, Ar
• 14.5 cm touch screen display
• Automatic opening and
closing of chamber

UniTemp GmbH
Senefelder Straße 9
D-85276 Pfaffenhofen

Applications:
• Annealing
• Rapid Thermal Processes
• SiAu, SiAl, SiMo alloying
• Low k dielectrica
• Post implanting annealing
•
•
• Si-Solar Wafer Cells on glass
by Si wafer bonding

Phone +49 (0) 8441-78 76 63
Fax
+49 (0) 8441-78 76 64

info@unitemp.de
www.unitemp.de