PRO-75/100 MBE Systems0 pages

MBE PRO 753-V01/Oct10
MBE Systems / PRO-75 & PRO-100 MBE System
PR0-75 and PRO-100 MBE System:
Standard System with Preparation/Storage
Chamber and with Loadlock Chamber
PRO-75 & PRO-100 chamber cross-section
Example for a realized system
PRO-75 & PRO-100 Design
Main Features:
•t Suitable for 3“ (PRO-75) and 4“ substrates (PRO-100)
•t Ultimate chamber design for up to 12 effusion cells
•t Large effusion cell capacity from 60 cm3 up to 200 cm3
for layer growth
•t Smaller effusion cell volumes from 1.5 cm3 to 10 cm3
t for doping applications
•t Rotary shutters for the effusion cells (optional linear
t shutter ports)
•t Source to substrate distance: 290 mm
•t Source angle tilt wrt. sample normal: 40°t
t => < 1% thickness homogeneity for a 4“ substrate
•t In-Vacuum length for effusion cells: t
287 mm for CF70
t t 270 mm for CF114
t t 250 mm for CF150
•t User adjustable tradeoff between thickness uniformity
t and material consumption (crucible insert)
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•t LN2 cooling shroud
•t Large pumping port for high pumping speed and
t true UHV using Turbo-, TSP-, IGP- or Cryo-Pump
•t System design allows for different growth applications:
t - Metal MBE Growth
t - Semiconductor Growth
t - Magnetic Materials Growth
t - Oxide MBE Growth
t - Organic MBE
•t Reliable sample manipulator with different heating
t options: Ta-Wire, W-Wire, SiC or PG-Heater
•t Main shutter for the sample manipulator
•t Easy and intuitive to operate the growth control
t software
•t Reliable and fast sample transfer
•t Ultimate performance at low cost of ownership