EKF 3000 pages

MBE PRO 753-V01/Oct10
EKF 300
0.1 to 5 KeV (Multi-function) Electron Source
With a high beam current, greater than 15 μA,
the EKF 300 includes an integral X-Y deflector,
with a scan range of more than ± 6 mm. The
NGE 52 intuitively displays all the source operating voltages and currents and provides an
interface for the remote control of beam energy
and beam blanking. The EKF 300 is connected to
the NGE 52 through a 12-pin feedthrough in a
CF 38 flange and a single cable for all operating
and scanning voltages.
The wide range of operating characteristics of the
EKF 300 are simply set by the grid voltages on the
control unit. Two grid voltage ranges, 0 to +60 V
(positive) and 0 to –200 V (negative), can be
selected by jumpers in the NGE 52. Producing a
full range of operation, with maximum flexibility.
AES survey spectrum
EKF 300, AES on Ag Sample
of Ag.
1x106
9x105
Intensity [CPS]
8x105
7x105
6x105
5x105
4x105
3x105
200
400
600
800 1000 1200 1400
Kinetic Energy [eV]
1600
1800
AES narrow scan
EKF 300, 5 kV, 10 nA, Ag Auger, CRR 4
spectrum on Ag at
high signal for rapid
3.0x106
chemical characterisation.
2.5x106
Intensity [CPS]
The EKF 300 Electron Source with the
NGE 52 Electron Source Power Supply is
a highly versatile 0.1 to 5 keV electron
source designed for both static Auger
measurements and for use as an electron flood source. The spot size can be
adjusted down to 300 μm within an
energy range from 1 keV to 5 keV at the
standard working distance of 66 mm.
2.0x106
1.5x106
1.0x106
200
250
300
Kinetic Energy [eV]
350
400
The positive range allows the source to operate
in a broad spot mode at higher beam currents
and low beam energy suitable for some charge
neutralisation applications. The negative range
allows the source to operate in a small spot mode
suitable for AES.
EKF 300 electron source for a wide range of AES applications.
www.omicron.de