Exicor® DUV0 pages

BIREFRINGENCE MEASUREMENT

Exicor® 193DUV
PRODUCT BULLETIN

The Exicor® DUV and 193 DUV systems measure
birefringence at deep ultraviolet wavelengths. The
2003 “R&D 100” award winning Exicor DUV system was
developed to evaluate intrinsic birefringence in Calcium
Fluoride (CaF2) lens materials at the application wavelength
of 157 nm. The subsequent Exicor 193 DUV focuses on a
variety of materials used in 193 nm lithographic systems,
especially immersion 193 nm lithography systems that
demand the highest quality optics. Both of these systems
satisfy the ‘measure at the wavelength of use’ principle
demanded by precision optical materials manufacturers who

Signicant Features

Heavy Duty Automated XY stage
to three selectable DUV wavelengths (157 nm, 193 nm,
Up
248 nm)
and 3D graphical representation of birefringence
2D
parameters

Advanced data analysis features included standard in user
interface

Large and adaptable stage platform design for adding
custom parts holders or process aids

are pushing the technology envelope.
The Exicor DUV and 193DUV systems are the primary
systems used by the leading lithography industry optics
manufactures to measure birefringence in lens blank
materials and photo-mask blanks at DUV lithographic
wavelengths (157 nm, 193 nm, 248 nm). These systems
are built with a robust frame and heavy duty motion control
components for measuring optics up to 400 mm x 400 mm
and 200+ mm thick. The Exicor DUV system also utilizes a
unique localized oxygen displacement system in the sample
chamber because 157 nm UV light is absorbed by oxygen
molecules. This clean dry nitrogen purged environment
also prevents the generation of ozone in the DUV sample
chamber. Purging is not required for 193 nm and 248 nm
measurements.
These systems’ large scanning stage also allows for loading
multiple smaller parts on the stage, with the optional Exicor
Macro+ software executing automated routines to scan
each part individually. The user can begin the routine and let
it run for multiple shifts, overnight or even longer (depending
on the application) without having to intervene.

Technology for Polarization Measurement

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