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Calibre ® MPCpro0 pages
Calibre® MPCpro
Manufacturability
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Key Product Benefits
• Provides high performance mask
process correction flexible, accurate and scalable while maintaining optimum data
quality and short mask writing
time
• Corrects systematic errors and
proximity effects resulting from
the use of electron beam lithography in the mask making process:
- Fogging effects
- Process loading effects
Variable sizing map for a microprocessor layout to compensate for long range loading
effects. The map was obtained by convolving the original density distribution with a
dual Gaussian kernel.
Mask Process Correction
for process loading and proximity effects
Calibre® MPCpro is a focused solution for mask making. The mask making
process is exposed to systematic errors induced by the ebeam lithography and
etching processes. Through variable sizing of the pattern the Calibre MPCpro
tool corrects process effects like fogging, development and etch loading and ebeam proximity effects. Build on the experience of the well established Calibre
OPCpro tool for optical process correction, MPCpro addresses the specific
needs of the mask manufacturing.
Shrinking feature sizes and the complexity of nanometer designs drive tighter
and tighter specifications for controlling the critical dimensions – mean to target
as well as the distribution across the mask. As previously in the wafer lithography domain the equipment and process control capabilities alone can not
achieve the required accuracy and hence technologists are looking to data
dependent corrections that will compensate the process effects to the required
tolerances.
MPCpro is part of the Calibre mask data preparation suite of tools, and is fully
integrated with the Calibre design to silicon platform. It includes the density
based long range correction functions for area based sizing, density measurement
and kernel convolution and a rules based correction module – OPCbias. MPCpro
provides highly scalable processing while maintaining the highest data quality
required for low tolerance mask fabrication.
www.mentor.com
- E-beam proximity effects
• Integrated with Calibre design-tosilicon platform
Family of Calibre MDP
Tools and Formatting
Capabilities
• FRACTUREm (MEBES)
• FRACTUREj (JEOL)
• FRACTUREt (Toshiba/NuFlare)
• FRACTUREh (Hitachi)
• FRACTUREc (Micronic)
• MDPverify
• MDPview
• MDPmerge
• MRC for mask rule checking
• MPCpro for mask process
correction
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